• 
    

    
    

      99热精品在线国产_美女午夜性视频免费_国产精品国产高清国产av_av欧美777_自拍偷自拍亚洲精品老妇_亚洲熟女精品中文字幕_www日本黄色视频网_国产精品野战在线观看

      ?

      EVG公司在SEMICONChina2014展示新的技術解決方案

      2014-07-04 03:27:22
      電子工業(yè)專用設備 2014年3期
      關鍵詞:抗蝕光刻制程

      全球領先的晶圓鍵合及光刻設備供應商EV Group (EVG)日前宣布,為加強中國半導體市場的實力,將在中國推進批量制造工藝解決方案并在上海開設區(qū)域總部。

      中國目前是世界半導體3D IC 集成和先進封裝技術開發(fā)與生產的重點地區(qū),抗蝕劑處理是這些制造技術中一種基本的加工程序。為了取得成功并確保在全球的競爭力, 對于中國的制造廠家來說,與擁有設備、技術和專有工藝技術的主要供應商合作,保持其制造能力迅速地由工藝開發(fā)向大批量制造過渡便顯得十分重要。

      EVG150XT 系統(tǒng)是EVG 公司最新推出的產品,它成功地集合了EVG 公司30 多年在光刻和大批量制造工藝方面的專業(yè)知識,率先為客戶提供生產意義的大批量制造抗蝕劑處理系統(tǒng),它能滿足在半導體制造中段制程和后段制程中大多數(shù)抗蝕劑處理、旋涂介質材料和厚膜的苛刻需求,包括用于2.5D 及3D-IC 集成的封裝技術中的硅通孔TSV 成形,晶圓鍵合、再分布層及轉接板制作等用途。

      新型EVG150XT 系統(tǒng)是一種通用的全自動抗蝕劑處理機臺, 適用于直徑到300 mm 的晶圓。為滿足不斷增長及變化的半導體市場需求,EVG150XT 系統(tǒng)圍繞3 個關鍵方面進行開發(fā):即改進工藝、縮短生產周期、智能軟件解決方案來實現(xiàn)復雜、高頻率更換工藝流程的需求。

      基于XT- 結構設計, EVG150XT 系統(tǒng)的9 個工藝模塊,能夠同時運行,實現(xiàn)多晶圓并行處理。此外, 該系統(tǒng)還集成了一個在線測量模塊, 用以檢查各種加工中的不規(guī)則性和缺陷,以便進行減少缺陷,提高成品率和降低生產成本的實時工藝修正。

      除了推出新的工藝解決方案外, EVG 公司還通過在上海開設新的子公司擴展在中國的業(yè)務,新的子公司將作為區(qū)域總部進行EVG 公司在中國境內的全部運營業(yè)務。新的EVG 中國子公司將具有服務中心和備件管理功能, 以進一步加強EVG 公司在該地區(qū)的實力。通過新公司的不斷努力,提高對中國客戶的服務和響應時間。

      詳情請咨詢位于上海新國際展覽中心的EVG公司2451 展臺。

      EV GROUP STRENGTHENS SUPPORT OF CHINESE SEMICONDUCTOR MARKET WITH VOLUME MANUFACTURING PROCESS SOLUTIONS AND NEW REGIONAL HEADQUARTERS IN SHANGHAI

      China is a key region for development and production of leading semiconductor technologies such as 3D-IC integration and advanced packaging. Resist processing is an essential process step for these manufacturing technologies. To be successful and remain globally competitive, it is important for manufacturers in China to partner with key suppliers that have the equipment,technology and process expertise to support their ability to quickly transition from process development into high-volume manufacturing(HVM).

      The latest product introduction from EV Group(EVG), called the EVG150XT, successfully combines EVG's expertise of more than 30 years in lithography and HVM processing to provide the first true HVM resist processing system that can meet the most demanding requirements for processing resists, spin-on dielectrics and thick films for mid-end-of-line (MEOL) and back-end-of-line (BEOL) semiconductor applications, including through silicon via (TSV) formation,wafer bumping, redistribution layer and interposer manufacturing for 2.5 and 3D-IC packaging.

      The new EVG150XT is a universal and fully-automated resist processing tool supporting wafers up to 300-mm in diameter. To meet the needs of the growing and fluctuating semiconductor market, the EVG150XT was developed around three key aspects:improved processing,short cycle times,and smart software solutions for complex, high-frequency process flows.

      Built on the XT-frame architecture, the EVG150XT features nine process modules that can operate simultaneously for multi-parallel wafer processing. In addition, an in-line metrology module has been integrated into the EVG150XT that can detect a variety of process irregularities and defects to enable real-time process corrections to reduce defects, increase yields and lower production costs.

      Besides new process solutions, EVG has also expanded its presence in China with the opening of a wholly owned subsidiary in Shanghai, which will serve as regional headquarters for all of EVG's operations in the People's Republic of China. The new EV Group China subsidiary, which houses a local service center and spare parts management facility,further strengthens EVG's presence in the region and supports the company's ongoing efforts to improve service and response times to local customers.

      EV Group will exhibit its technology solutions portfolio at SEMICON China, March 18-20, 2014.For more information, please visit EVG at Booth#2451 in the Shanghai New International Expo Center in Shanghai.

      猜你喜歡
      抗蝕光刻制程
      土壤抗蝕性評價指標體系與評價方法綜述
      【極紫外光刻】
      科學家(2017年20期)2017-11-10 13:05:44
      焊接式軸流風葉的制程與工藝裝備保障
      不同生物治理模式下紅壤抗蝕性變化特征及其影響因素
      高數(shù)值孔徑投影光刻物鏡的光學設計
      掩模位置誤差對光刻投影物鏡畸變的影響
      盱眙火山巖丘陵區(qū)不同林地土壤抗蝕性評價
      亞波長金屬光柵光刻條紋分布
      種植苧麻對南方坡耕地土壤抗蝕性的影響
      三星2011年下半推出20nm級制程DRAM
      乐昌市| 神农架林区| 南投市| 伊宁县| 中阳县| 沂南县| 若尔盖县| 托克托县| 灵山县| 资兴市| 都匀市| 含山县| 穆棱市| 明光市| 南靖县| 灵寿县| 合阳县| 迁安市| 东阳市| 平陆县| 卢龙县| 眉山市| 鄂托克旗| 安图县| 安达市| 佛坪县| 循化| 板桥市| 象山县| 星子县| 竹山县| 岚皋县| 玛纳斯县| 资溪县| 故城县| 布尔津县| 缙云县| 镇坪县| 凭祥市| 保山市| 永安市|